染色敏感性太陽能電池涂布試驗機簡單介紹：

狹(xia)縫式涂(tu)(tu)布(bu)試(shi)驗(yan)機由山東(dong)安尼麥(mai)特儀器有限公司精(jing)心研制高(gao)精(jing)度(du)(du)精(jing)密(mi)型(xing)涂(tu)(tu)布(bu)試(shi)驗(yan)機，本(ben)機主要應用(yong)(yong)于(yu)蓋(gai)板玻璃的(de)(de)各種涂(tu)(tu)膠(jiao)作(zuo)業(ye)而開發設(she)計的(de)(de)專用(yong)(yong)裝置(zhi)，同時(shi)也可(ke)以用(yong)(yong)于(yu)其他類似材(cai)料的(de)(de)涂(tu)(tu)布(bu)。本(ben)涂(tu)(tu)布(bu)試(shi)驗(yan)機，底(di)板采用(yong)(yong)微孔陶瓷吸附平臺，同時(shi)采用(yong)(yong)非接觸式狹(xia)縫式涂(tu)(tu)布(bu)頭，通過(guo)進料壓(ya)力，狹(xia)縫寬度(du)(du)調節(jie)，以及狹(xia)縫頭與(yu)(yu)底(di)板間隙三個因(yin)數(shu)控(kong)制濕膜厚(hou)度(du)(du)，同時(shi)軟件系(xi)統增加了(le)高(gao)度(du)(du)調節(jie)與(yu)(yu)反饋系(xi)統，大(da)(da)大(da)(da)提(ti)高(gao)了(le)涂(tu)(tu)布(bu)精(jing)度(du)(du)與(yu)(yu)均勻性。

應用場景：針對微(wei)米(mi)級特別是納米(mi)及亞微(wei)米(mi)級功能性涂層的涂布(bu)試(shi)驗、墨(mo)水(shui)調(diao)試(shi)、工(gong)藝研究、小(xiao)規模制樣研發等。

涉及(ji)行業：包括水(shui)凝膠、液態金屬、智能(neng)(neng)包裝材(cai)料(liao)、光(guang)電(dian)(dian)(dian)(dian)材(cai)料(liao)、光(guang)刻膠、功能(neng)(neng)涂層、微電(dian)(dian)(dian)(dian)子及(ji)半導體(ti)封裝等(deng)大面積(ji)涂布(bu)制備(bei)，以及(ji)氫燃料(liao)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)膜(mo)電(dian)(dian)(dian)(dian)極、電(dian)(dian)(dian)(dian)解水(shui)制氫膜(mo)電(dian)(dian)(dian)(dian)極、鋰(li)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、各種活性催化(hua)劑、異質結太(tai)(tai)陽(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、薄膜(mo)太(tai)(tai)陽(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、鈣(gai)鈦(tai)礦(kuang)太(tai)(tai)陽(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、有(you)機太(tai)(tai)陽(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、OLED柔性穿戴器(qi)件(jian)、有(you)機場效(xiao)應(ying)晶體(ti)管,導電(dian)(dian)(dian)(dian)聚合物,納米線和(he)(he)納米管,二維材(cai)料(liao),有(you)機發光(guang)二極管和(he)(he)鈣(gai)鈦(tai)礦(kuang)發光(guang)二極管、鈣(gai)鈦(tai)礦(kuang)光(guang)伏電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、鋰(li)離子電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)的電(dian)(dian)(dian)(dian)解質和(he)(he)電(dian)(dian)(dian)(dian)極、染色敏感性太(tai)(tai)陽(yang)能(neng)(neng)電(dian)(dian)(dian)(dian)池(chi)(chi)(chi)(chi)(chi)、電(dian)(dian)(dian)(dian)子皮膚等(deng)器(qi)件(jian)的制備(bei)。

由于常規實驗室(shi)涂布試驗機(ji)，受到(dao)刮刀調節(jie)，底(di)板平整度等的(de)影響很難達到(dao)涂布納(na)米級(ji)膜(mo)(mo)(mo)，狹(xia)縫式(shi)涂布試驗機(ji)，底(di)板采用(yong)檢驗級(ji)大理石(shi)平臺，同時采用(yong)非接觸式(shi)狹(xia)縫式(shi)涂布頭(tou)，通過(guo)進(jin)料壓力，狹(xia)縫寬度調節(jie)，以及狹(xia)縫頭(tou)與(yu)(yu)底(di)板間隙三個因數控制濕膜(mo)(mo)(mo)厚度，同時軟件系(xi)統增(zeng)加了(le)高度調節(jie)與(yu)(yu)反饋系(xi)統，大大提高了(le)涂布精度與(yu)(yu)均勻(yun)性。在國內光(guang)學膜(mo)(mo)(mo)涂布實驗室(shi)研發打樣階段(duan)得到(dao)了(le)廣泛的(de)應(ying)用(yong)。

染色敏感性太陽能電池涂布試驗機技術參數 

1.狹縫(feng)擠出(chu)頭(tou)材質：不銹鋼

2.狹縫擠出頭涂(tu)布寬(kuan)度(du)：10-50mm

3.狹(xia)縫擠出墊片厚(hou)度(du):100 μm

3.狹(xia)縫擠出墊片套裝:5 個(ge) 50毫米(mi)寬(kuan)墊片或5 個(ge) 25毫米(mi)寬(kuan)的墊片

4.電熱(re)板溫(wen)度:120°C

5.行程長度:10-100mm

6.平(ping)臺(tai)速度:100 μm.s-1

7.最高平(ping)臺(tai)速(su)度:50 mm s - 1

8.注射器速度:12 μm.s-1

9.最(zui)高(gao)注射速度:5 mm.s-1

10.涂布頭與基片之間最大活動距離:13 mm

11.管(guan)道和接(jie)頭材(cai)質:聚四氟(fu)乙(yi)烯(xi)管(guan)，高密度PP魯(lu)爾接(jie)口鎖定(ding)連接(jie)器(qi)、不銹鋼魯(lu)爾接(jie)口連接(jie)器(qi)至螺紋(wen)連接(jie)件

12.電源參(can)數(shu)：100 - 240 V 50Hz

13.尺寸規(gui)格:380 mm x 330 mm x 220 mm

14.重(zhong)量：30kg

產(chan)品特點 

1.集(ji)成度高-可以通過將涂布機集(ji)成到(dao)一個(ge)在線系(xi)統中，以達到(dao)提升產(chan)(chan)量、大幅度降低薄膜(mo)電子設(she)備的整體生(sheng)產(chan)(chan)成本(ben)。

2.簡(jian)單可靠—狹縫(feng)擠出式涂布是(shi)一(yi)種的制(zhi)造薄(bo)濕(shi)膜(mo)片的技術，多米長度涂層厚(hou)度變化小于2%。涂層厚(hou)度是(shi)通(tong)過改變溶(rong)液(ye)流量、基片速度進行(xing)控(kong)制(zhi)。通(tong)過對幾個(ge)不(bu)(bu)同幾何參數的設置(zhi)可以降低(di)涂層缺陷的機率(不(bu)(bu)改變涂層厚(hou)度)。

3.適(shi)合研(yan)(yan)(yan)究領域(yu)應(ying)用(yong)(yong)—盡管狹(xia)縫(feng)擠出(chu)(chu)式(shi)涂(tu)(tu)布(bu)(bu)(bu)是一項非常強大(da)(da)的(de)(de)(de)技術(shu)，但在(zai)薄膜(mo)電(dian)子應(ying)用(yong)(yong)領域(yu)的(de)(de)(de)研(yan)(yan)(yan)究和開(kai)發目(mu)前非常有(you)(you)限。因為它(ta)主要是一項工業技術(shu)，即使的(de)(de)(de)系(xi)統(tong)價格也很(hen)(hen)高(gao)，因為狹(xia)縫(feng)擠出(chu)(chu)式(shi)涂(tu)(tu)布(bu)(bu)(bu)機(ji)的(de)(de)(de)制造商定(ding)位的(de)(de)(de)是工業領域(yu)而非學術(shu)界。此外，這(zhe)些常規(gui)(gui)的(de)(de)(de)涂(tu)(tu)布(bu)(bu)(bu)系(xi)統(tong)通(tong)常很(hen)(hen)大(da)(da)、很(hen)(hen)復雜，對于剛剛開(kai)始(shi)沉積薄膜(mo)開(kai)發所需的(de)(de)(de)處(chu)理技術(shu)的(de)(de)(de)科研(yan)(yan)(yan)人(ren)員(yuan)來(lai)說并不適(shi)合。狹(xia)縫(feng)擠出(chu)(chu)式(shi)涂(tu)(tu)布(bu)(bu)(bu)機(ji)形體小(xiao)巧，操作方便(bian)，適(shi)合在(zai)實驗(yan)室(shi)使用(yong)(yong)，這(zhe)使科研(yan)(yan)(yan)人(ren)員(yuan)在(zai)實驗(yan)室(shi)中(zhong)(zhong)使用(yong)(yong)狹(xia)縫(feng)擠出(chu)(chu)式(shi)涂(tu)(tu)布(bu)(bu)(bu)機(ji)成為可能(neng)，并使科研(yan)(yan)(yan)人(ren)員(yuan)能(neng)夠優化溶(rong)劑配(pei)方和工藝參(can)數(shu)—而不需要大(da)(da)量的(de)(de)(de)打印運行。狹(xia)縫(feng)擠出(chu)(chu)式(shi)涂(tu)(tu)布(bu)(bu)(bu)將(jiang)有(you)(you)助(zhu)于研(yan)(yan)(yan)究人(ren)員(yuan)確保(bao)他們的(de)(de)(de)研(yan)(yan)(yan)究結果在(zai)實際(ji)大(da)(da)規(gui)(gui)模(mo)應(ying)用(yong)(yong)中(zhong)(zhong)的(de)(de)(de)落(luo)地。